• Title of article

    Two-dimensional modeling and optimization of a neutral loop discharge etcher in an argon plasma

  • Author/Authors

    Okraku-Yirenkyi، نويسنده , , Yaw and Sung، نويسنده , , Youl-Moon and Otsubo، نويسنده , , Masahisa and Honda، نويسنده , , Chikahisa and Sakoda، نويسنده , , Tatsuya، نويسنده ,

  • Issue Information
    روزنامه با شماره پیاپی سال 2002
  • Pages
    7
  • From page
    185
  • To page
    191
  • Abstract
    In order to ascertain the optimal conditions for plasma generation in a magnetic neutral loop discharge (NLD), experiments were conducted to determine the electron temperature, Te and electron density, ne distributions around the NL. For the plasma production efficiency, the ion flux density measurements were done. The experimental results were examined by using a model that included effects of a three-dimensional electromagnetic field with spatial decay of the RF electric field, and the limitation of the spatial extent of the electron motion and collision effect. From the experiments and modeling of the electron behavior, it was found that NLD plasma possesses the electron temperature Te and density ne peaks around the NL and there existed an optimum value of the magnetic field gradient for efficient plasma production.
  • Keywords
    Electron Temperature , electron density , Plasma processing , Neutral loop discharge , Electron meandering motion
  • Journal title
    Surface and Coatings Technology
  • Serial Year
    2002
  • Journal title
    Surface and Coatings Technology
  • Record number

    1803017