Title of article
Characterisation of the generation of ions in electron beam evaporator for the control of metal deposition processes
Author/Authors
Lyutovich، نويسنده , , A. and Maile، نويسنده , , K. and Gusko، نويسنده , , A. and Ashurov، نويسنده , , Kh. and Morozov، نويسنده , , S.، نويسنده ,
Issue Information
روزنامه با شماره پیاپی سال 2002
Pages
5
From page
105
To page
109
Abstract
By means of a specially designed ion detector, the dependence of ion current at the substrate on the electron emission current of the e-gun and bias-potential for the evaporation of Ti, Al, and Cr is investigated. It is illustrated by distinction of morphology of metal films, that the control of the parameters of bombarding ions can be a key for the control of the ion-assisted electron beam physical vapour deposition (EB-PVD) process.
Keywords
Electron beam physical vapour deposition , Ion detector , surface morphology , Metal evaporation
Journal title
Surface and Coatings Technology
Serial Year
2002
Journal title
Surface and Coatings Technology
Record number
1803238
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