In situ and real-time ellipsometry diagnostic techniques towards the monitoring of the bonding structure and growth kinetics: silicon oxide coatings

We present a modern methodology concerning the applicability of in situ and real-time optical diagnostic techniques for the study of the optical properties, bonding structure evolution during film growth, in the case of silicon oxide films deposited by e-beam evaporation. Fourier Transform IR Spectroscopic Ellipsometry (SE) was used for in situ and real-time monitoring of the film optical properties during growth. This technique enables the investigation of the films bonding structure and stoichiometry at different growth stages that were associated with the partial pressures of the evaporated species. In addition, films’ optical properties, density and surface and interface quality were studied by multi-wavelength SE in UV–vis region. This methodology reveals the potential of in situ and real-time diagnostic techniques, for the optimization of process control by the preparation of the appropriate transparent oxide coatings for various applications.