Title of article
Investigation on the pulsed DC plasma nitriding with optical emission spectroscopy
Author/Authors
Kim، نويسنده , , Yong M. and Kim، نويسنده , , Jong U. and Han، نويسنده , , Jeon G.، نويسنده ,
Issue Information
روزنامه با شماره پیاپی سال 2002
Pages
6
From page
227
To page
232
Abstract
We have investigated nitriding behavior by a pulsed DC plasma nitriding process. For effective control, it is necessary to monitor the density of the active nitrogen species in the plasma, which is responsible for the enhanced plasma–ferro-metal reaction. An optical emission spectroscopy (OES) method was employed for diagnostic analysis of the plasma during the processes. In this study, AISI H13 steels were nitrided at 550 °C for 4 h with various discharge times and nitrogen concentrations. Active species such as N2+, N2* were evaluated in terms of the first negative system [N2+(B2Σu+, ν′)→N2+(X2Σg+, ν″+hν], the second positive system [N2(C3Πu, ν′)→N2 (B3Πg, ν″)+hν] of nitrogen and Balmer series of hydrogen by OES. In addition, the structures of the samples were analyzed by XRD. It was found that the compound layer consists of the dominant γ′-Fe4N phase.
Keywords
Pulsed DC plasma nitriding , optical emission spectroscopy , Active species
Journal title
Surface and Coatings Technology
Serial Year
2002
Journal title
Surface and Coatings Technology
Record number
1803310
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