• Title of article

    Simulation of sheath and presheath dynamics in PIII

  • Author/Authors

    Briehl، نويسنده , , Boris and Urbassek، نويسنده , , Herbert M، نويسنده ,

  • Issue Information
    روزنامه با شماره پیاپی سال 2002
  • Pages
    5
  • From page
    131
  • To page
    135
  • Abstract
    Using the well-known one-dimensional particle-in-cell computer simulation algorithm, we have studied the response of the sheath and presheath on the sudden negative charging of a planar electrode. In contrast to previous investigations, we started from an equilibrium sheath structure, rather than from a homogeneous plasma. We obtained an improved description of the ion current density on the wall, the matrix sheath expansion and its dynamics.
  • Keywords
    Plasma simulation and modelling , Plasma immersion ion implantation (PIII) , Plasma source ion implantation (PSII)
  • Journal title
    Surface and Coatings Technology
  • Serial Year
    2002
  • Journal title
    Surface and Coatings Technology
  • Record number

    1803856