Title of article :
Simulation of sheath and presheath dynamics in PIII
Author/Authors :
Briehl، نويسنده , , Boris and Urbassek، نويسنده , , Herbert M، نويسنده ,
Issue Information :
روزنامه با شماره پیاپی سال 2002
Abstract :
Using the well-known one-dimensional particle-in-cell computer simulation algorithm, we have studied the response of the sheath and presheath on the sudden negative charging of a planar electrode. In contrast to previous investigations, we started from an equilibrium sheath structure, rather than from a homogeneous plasma. We obtained an improved description of the ion current density on the wall, the matrix sheath expansion and its dynamics.
Keywords :
Plasma simulation and modelling , Plasma immersion ion implantation (PIII) , Plasma source ion implantation (PSII)
Journal title :
Surface and Coatings Technology
Journal title :
Surface and Coatings Technology