Title of article
Simulation of sheath and presheath dynamics in PIII
Author/Authors
Briehl، نويسنده , , Boris and Urbassek، نويسنده , , Herbert M، نويسنده ,
Issue Information
روزنامه با شماره پیاپی سال 2002
Pages
5
From page
131
To page
135
Abstract
Using the well-known one-dimensional particle-in-cell computer simulation algorithm, we have studied the response of the sheath and presheath on the sudden negative charging of a planar electrode. In contrast to previous investigations, we started from an equilibrium sheath structure, rather than from a homogeneous plasma. We obtained an improved description of the ion current density on the wall, the matrix sheath expansion and its dynamics.
Keywords
Plasma simulation and modelling , Plasma immersion ion implantation (PIII) , Plasma source ion implantation (PSII)
Journal title
Surface and Coatings Technology
Serial Year
2002
Journal title
Surface and Coatings Technology
Record number
1803856
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