Plasma-based ion implantation utilising a cathodic arc plasma

Plasma-based ion implantation (PBII) is usually carried out with isotropic gaseous plasmas, such as a discharge in nitrogen. More recently, it has been applied using drifting plasmas, such as those produced by cathodic arcs, in order to allow efficient implantation of metallic species. The condensable nature of a cathodic arc plasma allows for the deposition of ion-stitched thin film coatings, as well as surface modification by ion implantation. In this paper the promising results for biomaterial fabrication are discussed in light of current limitations of the technique. The use of PBII to control preferred orientation in titanium nitride films is also discussed, together with implications for the physical mechanisms involved in the development of preferred orientations in thin films.