Study of phase formation of implantation layers by Al–MePBII into AgMgNi alloy

Al-PBII into AgMgNi alloy is carried out using the unbalance magnetron sputtering (UBMS) target and r.f. stimulation to generate metal plasma with a dynamic MePBII model. The depth profiles are acquired by XPS analysis. The details of the phase constitute that the samples are detected by both XRD analysis with a high power X-ray source (HPXRD) and a glancing XRD (GXRD) method. TEM image is used to further affirm the existence of a new alloy phase and describe the cross-section distribution of the new alloy phase. The results show that an Al implantation layer appears on the surface of AgMgNi alloy substrates. The contents of Al in the implantation layer decreased with increasing depth. The μ-Ag3Al phase is detected by HPXRD analysis. Further identification is done by TEM. The μ-Ag3Al phase is mainly formed in the region between the columnar Al layer on the surface and the Ag substrate. The orientation of μ-Ag3Al phase is related to the orientation of Ag substrate, which was produced by the fabrication of the original sample.