Author/Authors :
Yokota، نويسنده , , Katsuhiro and Nakamura، نويسنده , , Kazuhiro and Kasuya، نويسنده , , Tomohiko and Tamura، نويسنده , , Susumu and Sugimoto، نويسنده , , Takashi and Akamatsu، نويسنده , , Katsuya and Nakao، نويسنده , , Kazuyoshi and Miyashita، نويسنده , , Fumiyoshi، نويسنده ,
Abstract :
Titanium nitride films were deposited on SUS 304 stainless steel using an ion beam-assisted deposition technique. The N ions were accelerated at energy of 0.5–2.0 keV with an intensity of 0.1 mA/cm2 on the substrate. Substrates were held at temperatures of 400–770 °C during deposition. For the TiN films, hardness was in the range from 350 to 550 GPa, depending on the N ion-beam energy, while the lattice parameter was dependent on the N ion-beam energy and substrate temperature. The lattice parameter dependence of hardness for the TiN films deposited at temperatures lower than 600 °C differed from that for films deposited at temperatures above 700 °C.
Keywords :
permittivity , preferred orientation , Titanium nitride , Ion beam-assisted deposition (IBAD)
