Ion beam-assisted deposition of magnesium oxide thin film for PDP applications

MgO thin film is widely used in plasma display panel (PDP) technology. In this paper experimental results on the preparation of MgO thin films using ion beam-assisted deposition is presented and the effects of simultaneous irradiation with oxygen ion beams during film deposition are discussed. The films were deposited on Si and glass substrates. The ion-beam current density was 10 μA/cm2. Film preparation was carried out taking the ion beam energy and the deposition rate as variables. Stable, transparent and uniform films of MgO were prepared. The properties of MgO thin films were investigated using X-ray diffraction and Rutherford backscattering spectroscopy. Measurement results of film composition, density and crystallinity are presented.