Title of article
Effects of nitrogen partial pressure and pulse bias voltage on (Ti,Al)N coatings by arc ion plating
Author/Authors
Li، نويسنده , , Mingsheng and Wang، نويسنده , , Fuhui، نويسنده ,
Issue Information
روزنامه با شماره پیاپی سال 2003
Pages
6
From page
197
To page
202
Abstract
By virtue of the characteristics of arc ion plating (AIP) technique, the structure and composition of (Ti,Al)N coatings can be tailored by controlling N2 partial pressure and substrate bias. In this study, (Ti,Al)N coatings were deposited on 1Cr11Ni2W2MoV stainless steel by AIP. The effects of substrate pulse bias and nitrogen partial pressure on the deposition rate, droplet formation, elemental composition and phase structure of the coatings were investigated.
Keywords
Al)N coatings , arc ion plating , N2 partial pressure , Pulse bias voltage , (Ti
Journal title
Surface and Coatings Technology
Serial Year
2003
Journal title
Surface and Coatings Technology
Record number
1805350
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