Title of article
Chemically resistant anodic oxide films formed on Al–Nd alloy in non-aqueous electrolytes
Author/Authors
Mizutani، نويسنده , , Fumikazu and Takaha، نويسنده , , Hiroshi and Ue، نويسنده , , Makoto and Sugiyama، نويسنده , , Kiyoshi and Sato، نويسنده , , Nariaki، نويسنده ,
Issue Information
روزنامه با شماره پیاپی سال 2003
Pages
4
From page
147
To page
150
Abstract
Chemically resistant oxide films were formed by anodizing of Al–3 wt.% Nd alloy sputtered films in non-aqueous electrolytes that contain ammonium salicylate, ethylene glycol, and ethylene carbonate. The films were hardly etched by a typical etchant for Al thin films, while the films formed in conventional electrolytes were considerably etched. By secondary ion mass spectroscopy and atomic force microscopy, it was revealed that the films had a carbon rich outer layer.
Keywords
Chemical etching , atomic force microscopy , Secondary ion mass spectroscopy , Anodizing , aluminum alloy
Journal title
Surface and Coatings Technology
Serial Year
2003
Journal title
Surface and Coatings Technology
Record number
1805570
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