Tribological characteristics of highly wear-durable ECR-sputtered silicon nitride films

Silicon nitride films were deposited by ECR sputtering using a silicon target and a mixture of argon and nitrogen gases. The atomic composition, internal stress and wear durability of the deposited films were evaluated, the latter by an AFM nanowear test. We changed the deposition conditions and investigated the influence of the conditions on the internal stress and wear durability of the films deposited. Highly wear-durable silicon nitride film was deposited at a gas pressure of 0.14 Pa and nitrogen concentration of 16 vol.%.