Title of article
Early stage of tin oxide film growth in chemical vapor deposition
Author/Authors
Matsui، نويسنده , , Yuji and Mitsuhashi، نويسنده , , Michio and Goto، نويسنده , , Yoshio، نويسنده ,
Issue Information
روزنامه با شماره پیاپی سال 2003
Pages
4
From page
549
To page
552
Abstract
Early stage of film growth was studied for chemical vapor deposition tin oxide films. Nucleation of films was observed by using an atomic force microscope. It was found nucleation structure of the crystallites changed from isolated island-like to tightly interconnected as methanol concentration into source gases increased.
Keywords
Nucleation , atomic force microscopy , Tin oxide , Atmospheric pressure chemical vapor deposition
Journal title
Surface and Coatings Technology
Serial Year
2003
Journal title
Surface and Coatings Technology
Record number
1805802
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