Preparation of transparent conductive thin films by facing targets sputtering system

ZnO:Al thin films were deposited on the glass substrate by Facing Targets Sputtering apparatus with ZnO:Al (2 wt.%) and Zn targets. The influences of the ratio of gas flow rate [O2/(Ar+O2)] and substrate temperature have been investigated on the properties. The resistivity and optical transmittance of ZnO:Al thin films were under 1×10−4 Ω cm and over 80%, respectively. Also, resistivity was increased with increasing of substrate temperature.