The effect of pulsed magnetron sputtering on the properties of indium tin oxide thin films

Flat panel displays based on flexible plastic substrates have received a lot of spotlights for their applications in mobile devices. However, it has been difficult to deposit high quality transparent conducting oxide thin films on plastic substrates due to their high process temperature. In this study we report on the properties of indium tin oxide (ITO) thin films prepared by DC and pulsed magnetron sputtering at low temperature. The ITO films were deposited on soda-lime glass substrates at low substrate temperatures of 70 and 120 °C. The electrical, structural, optical, and surface properties of the films prepared by DC and pulse magnetron sputtering were compared. We discuss the role of the pulse power in determining ITO thin film properties that are important in flat panel display applications.