Ion dynamics of pulsed plasma source ion implantation in the sheath of a hemispherical bowl-shaped target

The temporal evolution of the pulsed plasma sheath during plasma source ion implantation is crucial as it affects the resultant surface properties and structures. In this paper two-dimensional fluid model is applied to the problem of computing ion dynamics in the sheath of a hemispherical bowl-shaped container. The potential in the sheath, the ion flux, dose distributions on the target surfaces are calculated by solving Poissonʹs equation and the equations of ion motion and continuity using finite difference methods. It is found that the differences in ion flux and dose along the inner, outer surfaces and the brim surface of the bowl exist.