Facing-target magnetron operation for the deposition of CNx thin films

Two configurations of circular facing-target magnetron sources were studied during the deposition of CNx films. One source has a simple axial magnetic field between the targets, in the second, a radial component is superimposed between the two targets. Both sources have a significantly enhanced charge carrier density near the axis of symmetry, compared to a conventional planar magnetron. The growth rate onto substrates, placed perpendicularly outside the sources is comparable to a conventional magnetron. It was found to be homogeneous up to 10% over 5 cm and can be described by a simple collision model.