Title of article :
Preparation of TiN film on the inner surface of a pipe by plasma-based ion implantation and deposition
Author/Authors :
Yukimura، نويسنده , , Ken and Ma، نويسنده , , Xinxin and Kumagai، نويسنده , , Masao and Kohata، نويسنده , , Mamoru and Saito، نويسنده , , Hidenori، نويسنده ,
Issue Information :
روزنامه با شماره پیاپی سال 2003
Pages :
4
From page :
694
To page :
697
Abstract :
Titanium nitride (TiN) films were prepared on the inner surface of a pipe with a diameter of 80 mm and a length of 150 mm using plasma-based ion implantation and deposition (PBII-D). A titanium cathodic arc discharge was generated at a nitrogen pressure of 8 Pa. Gold-colored TiN films were prepared. The film thickness decreases with increasing the distance from the cathodic arc source due to the spatial distribution of the plasma species. A grounded rod, which is placed in the center of the pipe, does not largely influence the film thickness, but enhances the microhardness of the prepared film. The center rod also makes the PBII-D process stable for applying a pulse voltage.
Keywords :
Plasma-based ion implantation , Cathodic arc deposition , Film Thickness , Microhardness , Titanium nitride
Journal title :
Surface and Coatings Technology
Serial Year :
2003
Journal title :
Surface and Coatings Technology
Record number :
1806619
Link To Document :
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