Spectroscopic investigations on silicon nitride deposition with the Plasmodul®

Investigations by emission light spectroscopy and mass spectrometry at gas mixture variations between the plasma compounds H2, N2, NH3 and SiH4 are presented to get information about the processes taking place in a silicon nitride deposition with the Plasmodul® out of the monomers NH3 and SiH4. The Plasmodul® is a microwave sustained low pressure plasma reactor with a modular concept based on the Duo-Plasmaline® principle which provides an easy upscaling for industrial applications.