Title of article
Deposition of amorphous carbon using a shunting arc discharge
Author/Authors
Yukimura، نويسنده , , Ken-ichi Kumagai، نويسنده , , Motoya and Kumagai، نويسنده , , Masao Ikeda-Saito، نويسنده , , Hidenori and Kohata، نويسنده , , Mamoru and Takaki، نويسنده , , Koichi، نويسنده ,
Issue Information
روزنامه با شماره پیاپی سال 2003
Pages
4
From page
1187
To page
1190
Abstract
Using the shunting arc discharge, preparation of a hydrogen free diamond-like carbon (DLC) film is demonstrated. The substrate is immersed into the plasma, and a series of pulse voltage is applied to the substrate was synchronized with a generation of the shunting arc with a peak current of 1.7 kA. The prepared film has a smooth surface with a dark blue color, with only droplets even without filtering system. The film is amorphous and a typical Raman spectrum with the D and G band is observed. The film thickness is largest in a voltage range of −4 to −8 kV, from which it is inferred that the carbon ions contribute to the film preparation.
Keywords
Plasma-based ion implantation , Diamond-like carbon , preferred orientation , arc discharge , Amorphous carbon film , Deposition
Journal title
Surface and Coatings Technology
Serial Year
2003
Journal title
Surface and Coatings Technology
Record number
1806865
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