• Title of article

    Deposition of amorphous carbon using a shunting arc discharge

  • Author/Authors

    Yukimura، نويسنده , , Ken-ichi Kumagai، نويسنده , , Motoya and Kumagai، نويسنده , , Masao Ikeda-Saito، نويسنده , , Hidenori and Kohata، نويسنده , , Mamoru and Takaki، نويسنده , , Koichi، نويسنده ,

  • Issue Information
    روزنامه با شماره پیاپی سال 2003
  • Pages
    4
  • From page
    1187
  • To page
    1190
  • Abstract
    Using the shunting arc discharge, preparation of a hydrogen free diamond-like carbon (DLC) film is demonstrated. The substrate is immersed into the plasma, and a series of pulse voltage is applied to the substrate was synchronized with a generation of the shunting arc with a peak current of 1.7 kA. The prepared film has a smooth surface with a dark blue color, with only droplets even without filtering system. The film is amorphous and a typical Raman spectrum with the D and G band is observed. The film thickness is largest in a voltage range of −4 to −8 kV, from which it is inferred that the carbon ions contribute to the film preparation.
  • Keywords
    Plasma-based ion implantation , Diamond-like carbon , preferred orientation , arc discharge , Amorphous carbon film , Deposition
  • Journal title
    Surface and Coatings Technology
  • Serial Year
    2003
  • Journal title
    Surface and Coatings Technology
  • Record number

    1806865