Growth of Nd:YAG films by the pulsed laser deposition method

This work presents X-ray diffraction results about the structural properties of thin yttrium aluminum garnet films doped with neodymium. For this purpose, series of samples on silicon substrates were made by the pulsed laser deposition method at various deposition conditions. Successful growth was achieved as long as the substrate temperature was maintained at least at 450 °C. Applied bias was found to exert a detrimental effect on the quality of the films. Laser-produced plasma plume of Y2O3 investigations by means of time-of-flight mass spectrometer were also performed.