Influence of zigzag microstructure on mechanical and electrical properties of chromium multilayered thin films

Chromium thin films exhibiting a columnar microstructure have been prepared by d.c. magnetron sputtering. The glancing angle deposition (GLAD) technique and the substrate motion have been implemented to sculpt this typical columnar microstructure into desired zigzag shapes. By changing the direction of the incident flux of the species impinging on the substrate surface, deposited films form columns that are tilted with respect to the substrate normal. A systematic and periodic variation of the angle of incidence ‘α’ and ‘−α’ (‘α’ ranging from 0 to 50°) was applied to deposit chromium multilayered thin films with a controlled zigzag microstructure. The growth mechanisms and the morphology of such films were studied by scanning electron microscopy and X-ray diffraction. The influence of the flux angle, as like as the size of one period of multilayered coating ‘Λ‘ (100<Λ<1000 nm), on the filmʹs Youngʹs modulus and nanohardness was investigated by nanoindentation. Electrical properties of these coatings were also measured and discussed taking into account period and microstructure.