Adhesion strength of TiN films synthesized on GCr15-bearing steel using plasma immersion ion implantation and deposition

TiN films were synthesized on GCr15-bearing steel by plasma immersion ion implantation and deposition (PIIID). During the experiments, the bias voltage was varied from −10 to −30 kV, and the ratio of implantation to deposition was adjusted from 1:10, 1:20, 1:30 to 1:40 by changing the pulse durations of the bias voltage and the vacuum arc discharge. Adhesion strength tests were carried out by scratch test. The results reveal that the adhesion strength between the film and the substrate is influenced by the bias voltage and the ratio of implantation to deposition significantly. In addition, the pretreatment of substrates and the interface layer have some impacts on the final adhesion strength.