Title of article
Electron localization and resonant tunneling in uniform nanocrystalline silicon quantum dot systems
Author/Authors
Chen، نويسنده , , X.Y. and Shen، نويسنده , , W.Z.، نويسنده ,
Issue Information
روزنامه با شماره پیاپی سال 2005
Pages
6
From page
30
To page
35
Abstract
In this paper, we review our recent investigation of the electronic transport in hydrogenated nanocrystalline silicon thin film grown on crystalline silicon substrate. The variable magnetic-field Hall measurements have been applied to extract the separated carrier information about the nc-Si:H, c-Si and their interface, where the formation of two-dimensional electron gas is clearly observed. With a decrease in the temperature, the nc-Si:H thin film shows a transition from the extended state to the band-tail state, together with a positive magneto-conductivity at extremely low temperatures. These results reveal the good uniformity of the quantum dots in the nc-Si:H thin film and the electron localization. Furthermore, we have successfully observed clear step-like and spike-like structures for the electrons resonant tunneling through the quasi-2D and 0D states in the I–V curves of the nc-Si:H/c-Si diode under strong electric field at low temperatures.
Keywords
Quantum interference theory , chemical vapor deposition , Resonant tunneling , Mobility spectrum analysis , Silicon , Nanostructure , Electron localization
Journal title
Surface and Coatings Technology
Serial Year
2005
Journal title
Surface and Coatings Technology
Record number
1809736
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