Application of inductively coupled plasma to CVD and PVD

Inductively coupled plasma (ICP) can be successfully applied to lowering the process temperature of CVD and PVD without sacrificing the deposition rate and the film qualities. Application examples of ICP to CVD and PVD have been shown with films for wear and corrosion protection, such as TiN, CrN, DLC, CxNy, and Ti–B–N, for decoration, such as TiN and Cr, for flat panel display devices such as Al:ZnO, and for other functional purposes, such as TiO2 and SnO2. These films were prepared at a high deposition rate and at a low deposition temperature, and showed a high hardness and adhesion strength with a dense micro-structure, a good surface uniformity, a high crystallinity as well as superior electrical and optical properties.