Title of article
NANO-motheye antireflection pattern by plasma treatment of polymers
Author/Authors
Kaless، نويسنده , , Antje and Schulz، نويسنده , , Ulrike and Munzert، نويسنده , , Peter and Kaiser، نويسنده , , Norbert، نويسنده ,
Issue Information
روزنامه با شماره پیاپی سال 2005
Pages
4
From page
58
To page
61
Abstract
The application of plasma treatment on transparent PMMA substrates has shown an effect of reducing surface reflection. This effect is based on a refractive index gradient created by a combination of chemical decomposition and physical etching on the polymer surface. A stochastic nanostructure was found by means of AFM and SEM. Conditions for the plasma treatment process and properties of the modified PMMA surfaces have been discussed.
Keywords
Roughness , Ion bombardment , Nanostructure , Polymers
Journal title
Surface and Coatings Technology
Serial Year
2005
Journal title
Surface and Coatings Technology
Record number
1809952
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