Numerical simulation of microwave field distribution for bifocal plasma sources

In this paper calculations of the electric field distribution are presented with regard to the development of new plasma sources with bifocal structures. These structures facilitate the separation of microwave emission and microwave concentration. Similar to a focusing optical mirror this approach leads to a concentration of wave energy in a focus region where the plasma can be ignited and maintained. lidity of this approach for microwaves at 2.45 GHz in dependence on geometry and configuration of the structure and the possibility of a linear extension was examined through the following steps: starting with a rectangular waveguide that was elliptically bulged to a bifocal structure in several scales, the same structure was stacked with a passageway in between. A complete removal of inner partitions was examined and finally the influence of a plasma-like absorber in the focus region. The result is a microwave concentration near the focus points and the structures are linearly extendable without bothering crosstalk or other side effects.