Atmospheric pressure chemical vapor deposition of titanium nitride on metals

Titanium nitride was deposited onto Ni, Mo and Co metal coupons by atmospheric pressure chemical vapor deposition of TiCl4/N2/H2 in the temperature range of 700 to 800 °C. As the deposition temperature increases, the crystallinity and deposition rates of the TiN coating also increased. Titanium nitride had the highest deposition rate on Ni among the metals. The morphology of the coating was also affected by the deposition temperature being more uniform and smoother at 700 °C and coarse grains started to appear at higher deposition temperatures. The TiN coating roughness is directly proportional to the surface grain size as determined by atomic force microscopy. The surface microstructures of the TiN coating on Mo and Co metal coupons coated at 700 °C consisted of irregular grains and became uneven at higher deposition temperatures.