Title of article :
On high dose nitrogen implantation of PVD titanium nitride
Author/Authors :
Sharkeev، نويسنده , , Yurii P. and Bull، نويسنده , , Steve J. and Perry، نويسنده , , Anthony J. and Klingenberg، نويسنده , , Melissa L. and Fortuna، نويسنده , , Sergei V. and Michler، نويسنده , , Markus and Manory، نويسنده , , Rafael R. and Shulepov، نويسنده , , Ivan A.، نويسنده ,
Issue Information :
روزنامه با شماره پیاپی سال 2006
Pages :
6
From page :
5915
To page :
5920
Abstract :
A 3 × 3 matrix of samples has been ion implanted with nitrogen at low-to-high doses and low-to-high current densities (dose rates). All samples show surface exfoliation which results in a loss of the implanted nitrogen and a consequent loss of the wear-resistant properties—a condition of over-implantation reminiscent of that observed with metal ion implantation. There is an uptake of post-implantation oxygen which is believed to form an amorphous TiO2 component in the surface leading to the well-established low frictional properties. This uptake decreases as the dose rate is increased and would lead to a loss of wear resistant properties. The work confirms that a dose of 3 × 1017 ions cm− 2 is optimal provided that the dose rate does not exceed the present industrial standard.
Keywords :
Surface treatment , Titanium nitride , Nitrogen ions , Ion implantation
Journal title :
Surface and Coatings Technology
Serial Year :
2006
Journal title :
Surface and Coatings Technology
Record number :
1812265
Link To Document :
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