Title of article :
The formation of γ-TiAl from Ti/Al multilayers with different periods
Author/Authors :
Ramos، نويسنده , , A.S. and Calinas، نويسنده , , R. and Vieira، نويسنده , , M.T.، نويسنده ,
Issue Information :
روزنامه با شماره پیاپی سال 2006
Pages :
5
From page :
6196
To page :
6200
Abstract :
In this paper multilayer thin films with periods (Λ) ranging from 4 to 1000 nm are studied in order to determine the maximum period leading to the γ-TiAl phase. The production of high period multilayers (Λ > 20 nm) requires the use of Ti and Al targets one by one. The influence of silver on the thin films transformation Ti/Al multilayer → γ-TiAl is also analysed. The introduction of a few percent of silver was performed by superimposing small Ag foils on the targets. The kinetics of the phase transformation was studied by differential scanning calorimetry and X-ray diffraction. Up to Λ = 200 nm, heat treating at 600 °C during 1 h leads to γ-TiAl, with or without small amounts of α2-Ti3Al, while for Λ = 500 and 1000 nm the presence of extra Al-rich phases is detected. For high periods (200, 500 and 1000 nm) an Al3Ti intermediate phase is formed. In the presence of silver the peak temperatures are shifted to lower values and the activation energy values slightly decrease.
Keywords :
B phase transitions , C magnetron sputtering , X thin films , X titanium aluminide , D Ti/Al multilayer , D silver
Journal title :
Surface and Coatings Technology
Serial Year :
2006
Journal title :
Surface and Coatings Technology
Record number :
1812386
Link To Document :
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