Title of article
The effect of plasma immersion ion implantation on the contact pressure and composition of titanium nitride thin films
Author/Authors
Lim، نويسنده , , S.H.N. and McCulloch، نويسنده , , D.G. and Bilek، نويسنده , , M.M.M. and McKenzie، نويسنده , , D.R. and du Plessis، نويسنده , , Christophe J. and Swain، نويسنده , , M.V. and Wuhrer، نويسنده , , R.، نويسنده ,
Issue Information
روزنامه با شماره پیاپی سال 2006
Pages
5
From page
396
To page
400
Abstract
The effect of plasma immersion ion implantation on the indentation hardness as measured by contact pressure and composition of cathodic arc deposited TiN thin films was investigated. According to Auger electron spectroscopy results, increasing the pulse bias voltage up to 18 kV has little effect on the composition of the TiN films. The nano-indentation hardness of the films was found to decrease linearly with increasing pulse bias voltage as the intrinsic stress within the films decreases. A model, based on the columnar microstructure observed in our TiN films, has been developed to explain the dependence of indentation hardness on stress.
Keywords
Titanium nitride , Indentation hardness , Plasma immersion ion implantation , composition , Cathodic arc
Journal title
Surface and Coatings Technology
Serial Year
2006
Journal title
Surface and Coatings Technology
Record number
1812988
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