Title of article
The hardness study of oxygen implanted aluminum thin films
Author/Authors
Mishra، نويسنده , , P. and Ghose، نويسنده , , D.، نويسنده ,
Issue Information
روزنامه با شماره پیاپی سال 2006
Pages
6
From page
965
To page
970
Abstract
Effects of mass analyzed low energy O2+ ion implantation in Al thin films on the hardening and microstrucure have been studied by nanoindenting atomic force microscopy (AFM). The fluence range was 1 × 1017–1 × 1018 O atoms/cm2. A maximum increase of hardness about 90% of the implanted samples is observed. Apparently there is no significant variation in the hardness values within the range of ion fluences investigated here. Finally, the surface roughness is found to decrease considerably by oxygen irradiation.
Keywords
RMS roughness , AFM , Al thin film , Nanoindentation , O2+ ion implantation , Hardness
Journal title
Surface and Coatings Technology
Serial Year
2006
Journal title
Surface and Coatings Technology
Record number
1813176
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