Ion beam etched diffraction gratings in fused quartz and lithium niobate

Optical diffraction gratings in fused quartz and lithium niobate are fabricated by standard photolithography technique and the following etching of argon ion beam at energy of 500 eV. The periods of the grating structures are designed from 13 to 50 μm. Diffraction patterns of the gratings are observed by a He–Ne laser beam. The etch depth is measured by a profilometer. A scanning electron microscope is used for visual inspection of the structures produced. These investigations show a series of fairly good microstructures formed on the surface region of the samples.