PI3D apparatus and technology at KERI

The paper outlooks development of plasma immersion ion implantation and deposition (PI3D) hardware and process at Korea Electrotechnology Research Institute (KERI), and discuss some issues of the technology. Taking into account implications of modeling and measurements of PI3, we developed a series of large volume dense plasma sources and high-voltage pulsed power supplies (HV PPS). Three built PI3D facilities have been served as stand benches for research on control of PI3D process, and improvement of the entire system specifications toward commercialization. Surface modification of various metals and polymers with PI3D were carried out to find out the prospective market niche for the technology. Eventually, closed cooperation of the plasma physics and pulsed power staff allowed creating state-of-the-art PI3D tools capable to fulfill industry demand.