Title of article :
Synthesis of carbon nitride thin films on Si(100) surface by using penning-type discharge sputtering technique
Author/Authors :
Li، نويسنده , , H.Y. and Shi، نويسنده , , Y.C. and FENG، نويسنده , , X.P.، نويسنده ,
Issue Information :
روزنامه با شماره پیاپی سال 2007
Abstract :
Carbon nitride thin films (CNx) were successfully synthesized on Si(100) substrate by a using penning-type discharge sputtering technique. The surface morphology of the films was characterized by Atomic Force Microscopy (AFM). The bonding structures in the membrane were characterized by both X-ray photoelectroscopy (XPS) and Fourier transform infrared (FTIR) spectroscopy.
Keywords :
Penning-type discharge , Bond structure , Carbon nitride
Journal title :
Surface and Coatings Technology
Journal title :
Surface and Coatings Technology
