Title of article
Influence of ion-bombardment-energy on thin zirconium oxide films prepared by dual frequency oxygen plasma sputtering
Author/Authors
Ohtsu، نويسنده , , Y. and Hino، نويسنده , , Y. and Misawa، نويسنده , , T. and Fujita، نويسنده , , H. and Yukimura، نويسنده , , K. and Akiyama، نويسنده , , M.، نويسنده ,
Issue Information
روزنامه با شماره پیاپی سال 2007
Pages
4
From page
6627
To page
6630
Abstract
Thin ZrO2 films were prepared using dual frequency oxygen reactive plasma sputtering for wear-resistance coating of ceramics products. Influences of ion-bombardment-energy Ei were investigated for improvement of film characteristics. The results revealed that the deposition rate and the hardness of the prepared ZrO2 thin films gradually increased with increasing Ei for Ei < 220–250 eV and then decreased, whereas the water-contact-angle on ZrO2 thin films was about 90 °, having a good water-repellent nature.
Keywords
Ion bombardment , Dual frequency plasma sputtering , Zirconium oxide
Journal title
Surface and Coatings Technology
Serial Year
2007
Journal title
Surface and Coatings Technology
Record number
1816281
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