Title of article
Effect of negative pulsed high-voltage-bias on diamond-like carbon thin film preparation using capacitively coupled radio-frequency plasma chemical vapor deposition
Author/Authors
Ohtsu، نويسنده , , Y. and Noda، نويسنده , , H. and Nakamura، نويسنده , , C. and Misawa، نويسنده , , T. and Fujita، نويسنده , , H. and Akiyama، نويسنده , , M. and Diplasu، نويسنده , , C.، نويسنده ,
Issue Information
روزنامه با شماره پیاپی سال 2007
Pages
4
From page
6674
To page
6677
Abstract
Mechanical properties of diamond-like carbon films by an effective addition of negative pulsed high-voltage-bias have been investigated in capacitively coupled CH4/Ar radio-frequency plasma. The results revealed that hardness and elastic modulus of the deposited film, estimated from nano-indentation load–displacement curve for about 1 μm-thick films, increase with the increase of the absolute value of high-voltage VNPHV for VNPHV < 5 kV and then saturate. Elastic recovery R got the highest value (> 90%) at VNPHV = 5 kV.
Keywords
DLC film , Negative pulsed high-voltage , Capacitively coupled plasma
Journal title
Surface and Coatings Technology
Serial Year
2007
Journal title
Surface and Coatings Technology
Record number
1816319
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