Title of article
Formation of superconducting regions of MgB2 by implantation of magnesium ions into boron substrate followed by intense pulsed plasma treatment
Author/Authors
Piekoszewski، نويسنده , , J. and Kempi?ski، نويسنده , , W. and Andrzejewski، نويسنده , , B. and Trybu?a، نويسنده , , Z. and Kaszy?ski، نويسنده , , J. and Stankowski، نويسنده , , J. and Stanis?awski، نويسنده , , J. and Barlak، نويسنده , , M. and Jagielski، نويسنده , , J. and Werner، نويسنده , , Z. and Gr?tzschel، نويسنده , , R. and Richter، نويسنده , , E.، نويسنده ,
Issue Information
روزنامه با شماره پیاپی سال 2007
Pages
5
From page
8175
To page
8179
Abstract
Mg ion implantation into boron substrates followed by pulsed Ar plasma treatment was used to form MgB2 compound. Rutherford Backscattering (RBS) analysis of the best samples revealed that the ratio of atomic concentration of Mg to B atoms could be close to the stoichiometry of MgB2 in the range of about 100 nm beneath the surface. Results of magnetically modulated microwave absorption (MMMA), magnetic moment and electrical conductivity measurements indicate the presence of superconductive grains with critical temperature Tc = 25 K. A gradual onset of microscopic percolation is inferred starting from 15 K although no full percolation has been reached.
Keywords
Ion implantation , MgB2 , Pulsed plasma treatment , Superconductivity
Journal title
Surface and Coatings Technology
Serial Year
2007
Journal title
Surface and Coatings Technology
Record number
1816908
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