Title of article
Detection of planar defects caused by ion irradiation in Si using molecular dynamics
Author/Authors
Nakagawa، نويسنده , , S.T. and Betz، نويسنده , , G. and Whitlow، نويسنده , , H.J.، نويسنده ,
Issue Information
روزنامه با شماره پیاپی سال 2007
Pages
5
From page
8393
To page
8397
Abstract
We have analyzed the evolution of defects caused by self-irradiation of crystalline silicon. A classical molecular dynamics simulation was followed by defect analysis using the Pixel Mapping (PM) method. The PM identified {311} planar defects and long-chain structures of the so-called <110> interstitial chains following low energy (1 keV) ion impact. The areal density obtained from simulation of self-interstitial atoms was about two thirds of that of experiments reported in the literature [Jpn. J. Appl. Phys. 30 (1991) L639], while the atomic configuration on respective planes agreed exactly.
Keywords
Crystallography , Molecular dynamics , defect analysis
Journal title
Surface and Coatings Technology
Serial Year
2007
Journal title
Surface and Coatings Technology
Record number
1817003
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