Title of article
Macroscale computer simulations to investigate the chemical vapor deposition of thin metal-oxide films
Author/Authors
Neyts، نويسنده , , E. and Bogaerts، نويسنده , , A. and De Meyer، نويسنده , , M. and Van Gils، نويسنده , , S.، نويسنده ,
Issue Information
روزنامه با شماره پیاپی سال 2007
Pages
4
From page
8838
To page
8841
Abstract
The chemical vapor deposition (CVD) of thin TiO2 films was studied on the macroscale level using a computational fluid model. The deposition rate was established for various substrate temperatures, showing the transition from a surface reaction rate limited regime to a mass limited regime.
Journal title
Surface and Coatings Technology
Serial Year
2007
Journal title
Surface and Coatings Technology
Record number
1817168
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