Plasma enhanced chemical vapour deposition of BCxNy films prepared from N-trimethylborazine: Modelling, synthesis and characterization

Thin BCxNy films were grown by plasma enhanced chemical vapour deposition using N-trimethylborazine and nitrogen mixture. The thermodynamic analysis of the chemical vapour deposition in the B–C–N–H–O system was carried out for temperatures from 300 to 1300 K, a total pressure from 1.33 to 1333 Pa, residual pressure of 0.40 Pa and a wide range of N2:B3N3H3(CH3)3 ratio. The effect of the substrate temperature and rf power on the chemical composition and optical properties of the deposits was studied by ellipsometry, scanning electron and atomic force microscopy, FTIR-spectroscopy, and optical transmittance spectrophotometry.