Title of article
Ferroelectric PbTiO3 films grown by pulsed liquid injection MOCVD
Author/Authors
A. Bartasyte، نويسنده , , A. and Bouregba، نويسنده , , R. and Dogheche، نويسنده , , E. and Boudard، نويسنده , , M. and Poullain، نويسنده , , G. and Chaix-Pluchery، نويسنده , , O. and Jimenez، نويسنده , , C. and Plausinaitiene، نويسنده , , V. and Remiens، نويسنده , , D. and Abrutis، نويسنده , , A. and Saltyte، نويسنده , , Z. and Weiss، نويسنده , , F.، نويسنده ,
Issue Information
روزنامه با شماره پیاپی سال 2007
Pages
5
From page
9340
To page
9344
Abstract
The influence of deposition conditions (pressure, growth rate, solution concentration, etc.) on the growth of ferroelectric PbTiO3 films by pulsed liquid injection MOCVD was examined. Pb(thd)2 and Ti(OiPr)2(thd)2 (thd = 2,2,6,6-tetramethyl-3,5-heptanedionate) dissolved in toluene were used as precursors. Films were grown on LaAlO3 (001) substrates for deposition process optimisation. PbTiO3/La1 − xSrxMnO3/LaAlO3 heterostructures were elaborated at optimized deposition conditions. The microstructure of the heterostructures was characterized by X-ray Diffraction and by Raman spectroscopy. Pt/PbTiO3/La1 − xSrxMnO3/LaAlO3 structures were used for ferroelectric, dielectric and piezoelectric characterisations of PbTiO3 films.
Keywords
MOCVD , PbTiO3 films , Ferroelectric and piezoelectric properties
Journal title
Surface and Coatings Technology
Serial Year
2007
Journal title
Surface and Coatings Technology
Record number
1817483
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