Local characterization of electrodeposited Ni–W amorphous alloys by Auger microanalysis

Electrodeposited Ni–W alloy layers on a Cu substrate were examined with the aid of X-ray diffraction (XRD), Scanning Electron Microscopy (SEM), X-ray electron microanalysis, and local Auger microanalysis. The results confirmed a high degree of homogeneity among the alloy layers deposited in optimized electrochemical conditions. High resolution Scanning Auger Microscopy (SAM) and local Auger spectra suggest the formation of an “intelligent” interphase layer of Ni, deposited prior to Ni–W alloy deposition. This finding contributes to our knowledge of the physical chemistry of electrodeposited layer–substrate interaction and interfacial phenomena.