Title of article :
The role of Ti interlayer in carbon nanotube growth
Author/Authors :
Chuang، نويسنده , , Chia-Chih and Liu، نويسنده , , Wei-Long and Chen، نويسنده , , Wen-Jauh and Huang، نويسنده , , Jin-Hua، نويسنده ,
Issue Information :
روزنامه با شماره پیاپی سال 2008
Abstract :
Vertically aligned multi-wall carbon nanotubes (CNTs) were grown on Ni/Ti/Si substrate by thermal chemical vapor deposition method in a microwave heating system. The results showed that vertically aligned CNTs could be uniformly grown on a large area substrate of 3 inch diameter. The Ti interlayer couldnʹt obstruct the interdiffusion of Ni and Si and the inward diffusion of O, Ti and C. The C atoms for CNTs growth were supplied from Ni particles at an early stage and from Ti interlayer at a later stage in the growth process.
Keywords :
growth mechanism , Carbon nanotube (CNT) , Thermal chemical vapor deposition (TCVD) , Ti interlayer
Journal title :
Surface and Coatings Technology
Journal title :
Surface and Coatings Technology