• Title of article

    Uniformity of 500-mm cylindrical plasma source sustained with multiple low-inductance antenna units

  • Author/Authors

    Setsuhara، نويسنده , , Yuichi and Tsukiyama، نويسنده , , Daisuke and Takenaka، نويسنده , , Kosuke، نويسنده ,

  • Issue Information
    روزنامه با شماره پیاپی سال 2008
  • Pages
    4
  • From page
    5238
  • To page
    5241
  • Abstract
    Uniformity of plasma density and 4s excited Ar (Ar⁎) density profiles in a 500-mm cylindrical plasma source sustained with eight LIA units have been investigated with a fluid-simulation code. Uniformity of the simulated radial profiles of plasma density on the substrate holder located at a distance of 300 mm from a top flange became better with increasing Ar pressure from 1.3 Pa to 6.7 Pa. The radial uniformity of plasma density in the central 300 mm region was evaluated to be approximately 4.0% at 6.7 Pa. Uniformity of the radial profiles of Ar⁎ density became better with increasing distance of the substrate holder to the down-stream region. In the present antenna configuration, fairly uniform radial profiles of Ar⁎ density can be obtained at a distance of 300 mm from the top flange.
  • Keywords
    Plasma source , Internal antenna , Fluid simulation , Uniformity , ICP
  • Journal title
    Surface and Coatings Technology
  • Serial Year
    2008
  • Journal title
    Surface and Coatings Technology
  • Record number

    1819418