• Title of article

    Comparison of carbon deposition on tungsten between molecular dynamics and dynamic Monte Carlo simulation

  • Author/Authors

    Inai، نويسنده , , Kensuke and Kikuhara، نويسنده , , Y. and Ohya، نويسنده , , Kaoru، نويسنده ,

  • Issue Information
    روزنامه با شماره پیاپی سال 2008
  • Pages
    5
  • From page
    5374
  • To page
    5378
  • Abstract
    To investigate the low-temperature plasma wall interactions in fusion devices, e.g., ITER, we have developed a molecular dynamics (MD) simulation code. The calculated results are compared with the dynamic Monte Carlo (MC) simulation. The W surface is bombarded with C atoms at the temperature of 10 eV–1keV. During the plasma exposure with low temperature, a thick C layer is formed on the W surface. At high plasma temperature W surface is eroded and the W-C mixed layer is formed. These results are consistent with the calculated ones with the dynamic MC code, EDDY [K. Ohya, Phys. Scr. T124, (2006) 70.]. Inhomogeneous deposition of C is calculated, which indicates that atomic scale roughness is important for the development of C deposition and material mixing.
  • Keywords
    Dynamic Monte Carlo simulation , Molecular dynamics simulation , Ion–solid interactions , Tungsten , carbon
  • Journal title
    Surface and Coatings Technology
  • Serial Year
    2008
  • Journal title
    Surface and Coatings Technology
  • Record number

    1819492