Author/Authors :
Yoo، نويسنده , , D.-G. and Nam، نويسنده , , S.-H. and Kim، نويسنده , , M.H. and Jeong، نويسنده , , S.H. and Jee، نويسنده , , H.-G. and Lee، نويسنده , , H.J. and Lee، نويسنده , , N.-E. and Hong، نويسنده , , B.Y. and Kim، نويسنده , , Y.J. and JUNG، نويسنده , , D. and Boo، نويسنده , , J.-H.، نويسنده ,
Abstract :
We deposited ZnO thin films at room temperature by RF magnetron sputtering method with home-made targets, and for application tests using these films as transparent conductive oxide (TCO) anodes, wet-chemical etching behaviors of ZnO films were also investigated using various chemicals. In order to fabricate ZnO-based OLED devices, various etchants such as HCl, HNO3, H2SO4 and H3PO4 have been studies for the wet etching of ZnO thin film. In this experiment, we introduced two new different chemicals as etchants, ferric chloride (FeCl3 ∙ 6H2O) and oxalic acid (C2H2O4) which were controlled with various concentrations in ZnO etching process and showed an anisotropy etching shape of ZnO films.
Keywords :
Chemical etching , ZnO thin film , Organic light emitting diode , RF sputtering , indium tin oxide , Transparent conductive oxide
