Title of article
Ion beam induced modification in GeOx thin films: A phase separation study
Author/Authors
Batra، نويسنده , , Y. and Kabiraj، نويسنده , , D. and Kumar، نويسنده , , S. and Kanjilal، نويسنده , , D.، نويسنده ,
Issue Information
روزنامه با شماره پیاپی سال 2009
Pages
3
From page
2415
To page
2417
Abstract
Formation of Ge crystallites in GeOx matrix as a result of heavy ion irradiation is reported. Micro-Raman spectra of the films show the evolution of Ge crystallite regions in GeOx thin films upon ion irradiation with 100 MeV Au. Transmission electron microscopic studies of the irradiated films revealed the presence of Ge crystallites. Crystallinity of the Ge nanoparticles was confirmed by high-resolution electron microscope images. Atomic force microscopy was employed to study the modifications in surface morphology of GeOx films before and after irradiation. Formation of Ge nanocrystallites has been explained on the basis of phenomenon of ion beam induced phase separation.
Keywords
Ion beam synthesis , nanocrystals , Phase separation
Journal title
Surface and Coatings Technology
Serial Year
2009
Journal title
Surface and Coatings Technology
Record number
1820751
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