• Title of article

    Composition–constitution–morphology relationship of Al2O3 thin films deposited by plasma assisted chemical vapor deposition

  • Author/Authors

    Snyders، نويسنده , , Rony and Jiang، نويسنده , , Kaiyun and Music، نويسنده , , Denis and Konstantinidis، نويسنده , , Stephanos and Markus، نويسنده , , Torsten and Reinholdt، نويسنده , , Alexander and Mayer، نويسنده , , Joachim and Schneider، نويسنده , , Jochen M.، نويسنده ,

  • Issue Information
    روزنامه با شماره پیاپی سال 2009
  • Pages
    7
  • From page
    215
  • To page
    221
  • Abstract
    We have studied the correlation between the chemical composition, constitution and morphology of Al2O3 using experimental and theoretical means. Combining scanning electron microscopy, transmission electron microscopy, electron dispersive X-ray analysis and ab initio calculations, we have investigated the formation of pores. Desorption measurements show chlorine release from γ- and α-alumina films. Based on ab initio calculations, we have established that Cl can be incorporated in both γ- and α-alumina. Furthermore, two Cl atoms are likely to agglomerate since the total energy is reduced, compared to an unagglomerated configuration. We propose that Cl agglomeration is the first step towards Cl2 formation and subsequent precipitation and bubble formation. It can be learned that the Cl incorporation has to be minimized during growth of dense alumina coatings.
  • Keywords
    PECVD alumina , Ab initio calculations , Bubble formation , Cl incorporation
  • Journal title
    Surface and Coatings Technology
  • Serial Year
    2009
  • Journal title
    Surface and Coatings Technology
  • Record number

    1821378