Title of article
Microwave ECR plasma CVD of cubic Y2O3 coatings and their characterization
Author/Authors
Barve، نويسنده , , S.A. and Jagannath and Mithal، نويسنده , , N. and Deo، نويسنده , , M.N. and Chand، نويسنده , , N. and Bhanage، نويسنده , , B.M. and Gantayet، نويسنده , , L.M. and Patil، نويسنده , , D.S.، نويسنده ,
Issue Information
روزنامه با شماره پیاپی سال 2010
Pages
6
From page
3167
To page
3172
Abstract
Yttrium oxide (Y2O3) thin films are deposited by microwave electron cyclotron resonance (ECR) plasma assisted metal organic chemical vapour deposition (MOCVD) process at a substrate temperature of 350 °C using indigenously developed metal organic precursors (2,2,6,6-tetra methyl-3,5-heptane dionate) yttrium, commonly known as Y(thd)3 synthesized by ultrasound method. The deposited coatings are characterized by X-ray photoelectron spectroscopy, glancing angle X-ray diffraction, scanning electron microscopy, EDS and infrared spectroscopy. The characterization results indicate that it is possible to deposit non-porous coatings with excellent uniformity of a single phase cubic Y2O3 on various substrates by this process at reasonably low substrate temperature that is desirable in various manufacturing processes.
Keywords
ECR , XPS , MOCVD , Y2O3
Journal title
Surface and Coatings Technology
Serial Year
2010
Journal title
Surface and Coatings Technology
Record number
1822526
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